Product Description

The AS-One RTP system can process samples up to **0 mm diameter. The machine has been specially developed to meet the requirements of universities, research laboratories, quality control and small-scale production.

The high reliability guarantees low cost of ownership and allows small scale production up to *0,**0 wafers per year.

The system has a stainless steel water-cooled chamber. The cold wall chamber technology provides significant advantages:

•    High process reproducibility
•    Low memory effect
•    Higher cooling rates
•    Ultra clean and contamination-free environment
•    No metallic and no cross contamination

Both pyrometer and thermocouple temperature measurements are standard features. The fast digital PID temperature controller provides high temperature reproducibility (± 1°C). The system assures accurate and repeatable thermal control across the temperature range.

The clam shell style design of the process chamber gives full access to the bedplate and provides easy loading and unloading of the wafers and practical thermocouple installation.

The AS-One can receive a turbo molecular pumping unit in order to provide ultra clean process environment.

Silicon carbide coated graphite susceptors are available for processing of compound semiconductor and small samples. The design of susceptor and process chamber allows enhanced temperature control and process uniformity.

An industrial PLC guarantees a reliable control of the AS-One system while a PC provides an easy programming and monitoring tool.

Performance characteristics:
Temperature range: RT to ***0°C
Ramp rate up to **0°C/s
Cooling rate up to **0°C/s with special equipment
Gas mixing capability with mass flow controllers
Vacuum range: Atmosphere to ***6 Torr